Gate-geometry dependence of electrical characteristics of p-GaN gate HEMTs

نویسندگان

چکیده

In this Letter, we experimentally investigate the impact of gate geometry on forward operation Schottky-gate p-GaN high electron mobility transistors (HEMTs). particular, analyze devices with changing gate-metal/p-GaN junction area and p-GaN/AlGaN/GaN heterostructure in linear regime. These exhibit unique threshold voltage subthreshold swing scaling dependence that is contrast classic field-effect transistors. On other hand, peak transconductance ON resistance are found to scale classically. We find these results arise from fact a Schottky contact layer, under steady-state conditions, layer set by current continuity across stack. Furthermore, detailed study reveals flow not uniform—instead, it preferentially flows through ungated portion layer. Our concludes Schottky-type HEMTs, respective areas two junctions constitute an additional design degree freedom fine-tune device performance.

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ژورنال

عنوان ژورنال: Applied Physics Letters

سال: 2022

ISSN: ['1520-8842', '0003-6951', '1077-3118']

DOI: https://doi.org/10.1063/5.0084123